Company Filing History:
Years Active: 2021
Title: Daisuke Minoshima - Innovator in Substrate Cleaning Technology
Introduction
Daisuke Minoshima is a prominent inventor based in Tokyo, Japan. He is known for his contributions to substrate cleaning technology, which plays a crucial role in various manufacturing processes. His innovative approach has led to the development of advanced cleaning apparatuses that enhance efficiency and effectiveness in substrate maintenance.
Latest Patents
Daisuke Minoshima holds a patent for a substrate cleaning apparatus, substrate cleaning method, and control method of the substrate cleaning apparatus. This patent includes various examples regarding substrate cleaning apparatus and methods, as well as related apparatus and methods. According to one embodiment, the substrate cleaning apparatus features a substrate holding and rotating module, an elongated cleaning member that contacts the substrate during rotation, and two nozzles. The first nozzle is designed to supply liquid more forcefully than the second nozzle, ensuring that the liquid reaches a specific area on the substrate effectively.
Career Highlights
Daisuke Minoshima is associated with Ebara Corporation, a leading company in the field of fluid machinery and environmental engineering. His work at Ebara has allowed him to focus on innovative solutions that address the challenges faced in substrate cleaning processes. His dedication to research and development has positioned him as a key figure in this specialized area.
Collaborations
Daisuke Minoshima collaborates with Masayoshi Imai, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the exchange of ideas and advancements in substrate cleaning technology.
Conclusion
Daisuke Minoshima's contributions to substrate cleaning technology exemplify the importance of innovation in manufacturing processes. His patent and work at Ebara Corporation highlight his commitment to improving efficiency and effectiveness in substrate maintenance.