Poughkeepsie, NY, United States of America

Daisuke Kato

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Kato. Retrieved from https://idiyas.com/inventor/daisuke-kato-62a5n7hm

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Daisuke Kato: Innovator in Semiconductor Memory Devices

Introduction

Daisuke Kato is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique patent that addresses challenges in memory device layouts.

Latest Patents

Kato holds a patent for an "Irregular pitch layout for a semiconductor memory device." This invention provides a layout arrangement that creates additional space for locating an extra circuit device in a pitch-limited circuit. By arranging circuit elements in a specific manner, Kato's design allows for a more efficient use of space, enhancing the functionality of semiconductor memory devices.

Career Highlights

Daisuke Kato is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to focus on advancing semiconductor technologies. Kato's expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations

Kato collaborates with fellow inventor Yohji Watanabe, contributing to the advancement of semiconductor technologies. Their combined efforts aim to push the boundaries of what is possible in memory device design.

Conclusion

Daisuke Kato's contributions to semiconductor memory devices exemplify the spirit of innovation. His patent reflects a deep understanding of circuit design and a commitment to improving technology. Kato's work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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