Satsumasendai, Japan

Daiki Watanabe

This inventor holds 2 USPTO granted patents. Top assignee: Kyocera Corporation. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daiki Watanabe. Retrieved from https://idiyas.com/inventor/daiki-watanabe-ls9qr94l

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Daiki Watanabe: Innovator in Plasma Treatment Technology

Introduction

Daiki Watanabe is a notable inventor based in Satsumasendai, Japan. He has made significant contributions to the field of plasma treatment technology. His innovative work has led to the development of a unique plasma treatment apparatus member.

Latest Patents

Watanabe holds 1 patent for his invention titled "Plasma treatment apparatus member." This apparatus includes a base made of ceramic, a plasma electrode, a heating element, and a conductive layer. The design ensures that the heating element and conductive layer do not overlap in plan view and are positioned at different heights, enhancing the efficiency of the plasma treatment process.

Career Highlights

Daiki Watanabe is associated with Kyocera Corporation, a leading company in advanced ceramics and electronics. His work at Kyocera has allowed him to focus on innovative solutions in plasma technology, contributing to the company's reputation for excellence in research and development.

Collaborations

Watanabe collaborates with Miki Hamada, a fellow innovator, to further enhance the capabilities of their inventions. Their teamwork exemplifies the spirit of innovation and collaboration within the field.

Conclusion

Daiki Watanabe's contributions to plasma treatment technology reflect his dedication to innovation and excellence. His patent and work at Kyocera Corporation highlight the importance of advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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