The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jun. 09, 2022
Kyocera Corporation, Kyoto, JP;
Daiki Watanabe, Satsumasendai, JP;
Miki Hamada, Satsumasendai, JP;
Yuusaku Ishimine, Satsumasendai, JP;
KYOCERA Corporation, Kyoto, JP;
Abstract
A plasma treatment apparatus member according to the present disclosure includes a base, a plasma electrode, a heating element, and a conductive layer. The base is made of a ceramic and has a facing surface facing an object to be processed. The plasma electrode is located inside the base. The heating element and the conductive layer are located farther from the facing surface than the plasma electrode are, inside the base. The heating element and the conductive layer do not overlap each other in plan view seen from a direction orthogonal to the facing surface, and are located at different heights in side view seen from a direction parallel to the facing surface.