Satsumasendai, Japan

Miki Hamada

USPTO Granted Patents = 2 

Average Co-Inventor Count = 1.5

ph-index = 1


Company Filing History:


Years Active: 2023-2025

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2 patents (USPTO):Explore Patents

Title: Miki Hamada: Innovator in Plasma Treatment Technology

Introduction

Miki Hamada is a notable inventor based in Satsumasendai, Japan. She has made significant contributions to the field of plasma treatment technology, holding a total of 2 patents. Her work focuses on developing advanced apparatuses that enhance processing capabilities in various applications.

Latest Patents

Hamada's latest patents include a plasma treatment apparatus member and a sample holder. The plasma treatment apparatus member features a ceramic base with a plasma electrode, a heating element, and a conductive layer. This innovative design ensures that the heating element and conductive layer do not overlap in plan view and are positioned at different heights, optimizing the treatment process. The sample holder consists of an insulating base body with an electrically conducting member, a lead pin, and a tubular member that surrounds the lead pin. This design enhances the functionality and efficiency of the sample handling process.

Career Highlights

Miki Hamada is currently employed at Kyocera Corporation, where she continues to push the boundaries of innovation in her field. Her work has garnered attention for its practical applications and contributions to technology.

Collaborations

Hamada collaborates with her coworker, Daiki Watanabe, who is also a talented professional in the field. Together, they work on projects that aim to advance plasma treatment technologies.

Conclusion

Miki Hamada's contributions to plasma treatment technology exemplify her innovative spirit and dedication to advancing the field. Her patents reflect her commitment to improving processing techniques, making her a significant figure in the world of inventions.

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