Edgewater, NJ, United States of America

Daihyun Lim

This inventor holds 11 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: International Business Machines Corporation, Elenion Technologies, LLC. Active years: 2012-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daihyun Lim. Retrieved from https://idiyas.com/inventor/daihyun-lim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 36.4

 

Average Co-Inventor Count = 3.0

ph-index = 4

Forward Citations = 34(Granted Patents)


Location History:

  • White Plains, NY (US) (2012)
  • West New York, NY (US) (2014)
  • West New York, NJ (US) (2013 - 2015)
  • Hopewell Junction, NY (US) (2013 - 2015)
  • Edgewater, NJ (US) (2017 - 2021)

Company Filing History:


Years Active: 2012-2021

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11 patents (USPTO):Explore Patents

Title: Inventor Daihyun Lim: Revolutionizing Technology in Edgewater

Introduction: Daihyun Lim is a visionary inventor based in Edgewater, NJ, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Daihyun Lim holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovative spirit.

Career Highlights: With a career spanning over two decades, Daihyun Lim has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have had a significant impact on various industries.

Collaborations: Throughout his career, Daihyun Lim has collaborated with top scientists, engineers, and researchers from around the world, fostering a culture of innovation and knowledge-sharing that has led to remarkable advancements in technology.

Conclusion: Daihyun Lim's relentless pursuit of innovation and his passion for pushing the boundaries of what is possible make him a true pioneer in the world of technology, inspiring the next generation of inventors to dream big and create a better future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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