Dagmar Antoinette Wismeijer

Title: Dagmar Antoinette Wismeijer: Innovator in Lithographic Technology

Introduction

Dagmar Antoinette Wismeijer is a notable inventor based in Zeist, Netherlands. She has made significant contributions to the field of lithographic technology, particularly through her innovative patent related to fluid handling systems.

Latest Patents

Wismeijer holds a patent for a fluid handling system, method, and lithographic apparatus. This invention involves a lithographic apparatus that includes a substrate holder designed to hold a substrate and a projection system that projects a radiation beam onto the substrate. The fluid handling system is engineered to confine immersion liquid to a specific space between a part of the projection system and the substrate's surface. This design allows the radiation beam to effectively irradiate the substrate surface by passing through the immersion liquid. Additionally, an excitation device is incorporated to generate surface acoustic waves in the substrate, which propagate toward the immersion liquid. This innovative approach enhances the efficiency and effectiveness of lithographic processes.

Career Highlights

Wismeijer is currently employed at ASML Netherlands B.V., a leading company in the development of advanced lithography systems for the semiconductor industry. Her work at ASML has positioned her as a key player in the advancement of lithographic technology.

Collaborations

Throughout her career, Wismeijer has collaborated with esteemed colleagues, including Cornelius Maria Rops and Christianus Wilhelmus Johannes Berendsen. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Dagmar Antoinette Wismeijer is a pioneering inventor whose work in lithographic technology has made a significant impact on the industry. Her innovative patent and contributions at ASML Netherlands B.V. highlight her role as a leader in advancing lithographic processes.