This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Daekun Ahn - Innovator in Image Sensor Technology
Introduction
Daekun Ahn is a prominent inventor based in Seoul, South Korea. He is known for his contributions to the field of image sensor technology. His innovative work has led to the development of a unique patent that enhances the functionality of image sensors.
Latest Patents
Daekun Ahn holds a patent for an image sensor that includes a buried gate. This image sensor features a semiconductor substrate with a photoelectric conversion region. The design incorporates a floating diffusion region adjacent to the first surface of the substrate. A buried gate structure is integrated within a trench that extends from the first surface towards the interior of the semiconductor substrate. This structure includes two buried gate electrodes, which are strategically placed to optimize the sensor's performance.
Career Highlights
Daekun Ahn is currently employed at Samsung Electronics Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of image sensor technology. He has made significant strides in improving the efficiency and effectiveness of these sensors.
Collaborations
One of his notable coworkers is Hyuksoon Choi. Together, they have worked on various projects that aim to advance the field of image sensors.
Conclusion
Daekun Ahn's contributions to image sensor technology exemplify his innovative spirit and dedication to advancing the field. His patent for an image sensor with a buried gate showcases his ability to create solutions that enhance technological capabilities.