The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2026

Filed:

Nov. 08, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Hyuksoon Choi, Suwon-si, KR;

Daekun Ahn, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10F 39/00 (2025.01);
U.S. Cl.
CPC ...
H10F 39/8027 (2025.01); H10F 39/8023 (2025.01); H10F 39/8037 (2025.01); H10F 39/807 (2025.01);
Abstract

An image sensor includes a semiconductor substrate including a first surface and a second surface and having a photoelectric conversion region disposed therein. A floating diffusion region is disposed within the semiconductor substrate. The floating diffusion region is adjacent to the first surface. A buried gate structure is disposed within a buried gate trench extending from the first surface of the semiconductor substrate towards an interior of the semiconductor substrate, the buried gate structure including a first buried gate electrode inside a first buried gate trench adjacent to a first side part of the floating diffusion region, and a second buried gate electrode inside a second buried gate trench spaced apart from the first buried gate trench and adjacent to a second side part of the floating diffusion region, the second side part being opposite to the first side part.


Find Patent Forward Citations

Loading…