This inventor holds 1 USPTO granted patent. Top assignee: Samsung Corning Co., Ltd.. Active years: 2007.
Company Filing History:
Years Active: 2007
Title: Daechul Park: Innovator in Insulating Film Technology
Introduction
Daechul Park is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of insulating film compositions. His innovative work has led to the creation of a patented technology that enhances mechanical properties in insulating films.
Latest Patents
Daechul Park holds a patent for an insulating film composition that boasts improved mechanical properties. This composition includes a silica sol with excellent dispersion stability, an organic siloxane polymer, and a hydrophobic organic solvent. The silica sol features primary particles with an average size of 5 to 15 nm and secondary particles with an average size of 70 to 100 nm. The combined weight of these silica particles ranges from 2 to 50% based on the total weight of the silica particles and the organic siloxane polymer. This innovation is crucial for applications requiring both mechanical strength and insulation.
Career Highlights
Daechul Park is currently employed at Samsung Corning Co., Ltd., where he continues to advance his research and development efforts. His work at this prestigious company has allowed him to collaborate with leading experts in the field and contribute to cutting-edge technologies.
Collaborations
Some of Daechul Park's notable coworkers include Taewan Kim and Jihoon Rhee. Their collaborative efforts have further enhanced the research and development initiatives at Samsung Corning Co., Ltd.
Conclusion
Daechul Park's innovative contributions to insulating film technology exemplify the importance of research and development in advancing material sciences. His patented work not only showcases his expertise but also highlights the potential for future advancements in this field.