This inventor holds 1 USPTO granted patent. Top assignee: Hansol Chemical. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Dae-Won Ryu: Thin-Film Deposition Precursor Innovation.
Introduction
Dae-Won Ryu is an inventor based in Wanju, South Korea. His patent work concerns precursor compositions for depositing thin films through vapor deposition, including atomic layer deposition (ALD) and chemical vapor deposition (CVD).
Latest Patents
Ryu is associated with 1 patent: “Composition, Precursor Composition Including Same, and Method of Manufacturing Thin Film Using Same Precursor Composition.” The invention proposes a composition designed to provide reactivity, volatility, and thermal stability for vapor deposition. It also describes a precursor composition containing the material and a method for manufacturing a thin film using that precursor.
Career Highlights
Ryu is associated with Hansol Chemical. His patent reflects work on materials and processes intended to support thin-film manufacturing using ALD or CVD.
Collaborations
The provided information lists Kyu-Hyun Yeom and Ki-Yeung Mun as Ryu’s coworkers. Their specific roles in the patent or related work are not specified.
Conclusion
Dae-Won Ryu’s documented invention focuses on a vapor-deposition precursor composition and its use in thin-film manufacturing, connecting his patent work with Hansol Chemical.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile