The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

Aug. 20, 2024
Applicant:

Hansol Chemical Co., Ltd, Seoul, KR;

Inventors:

Kyu-Hyun Yeom, Wanju-gun, KR;

Ki-Yeung Mun, Wanju-gun, KR;

Dae-Won Ryu, Wanju-gun, KR;

Jang-Hyeon Seok, Sejong-si, KR;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C07F 5/00 (2006.01); C23C 16/18 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C07F 5/00 (2013.01); C23C 16/18 (2013.01);
Abstract

Proposed is a vapor deposition precursor composition that enables thin film deposition through vapor deposition. Specifically, proposed is a novel composition applicable to atomic layer deposition (ALD) or chemical vapor deposition (CVD), in which the novel composition having excellent reactivity, volatility, and thermal stability, a precursor composition containing the novel composition. Additionally, a method of manufacturing a thin film using the precursor composition is proposed.


Find Patent Forward Citations

Yeom, Kyu-Hyun. (2026). Composition, precursor composition including same, and method of manufacturing thin film using same precursor composition (U.S. Patent No. 12644181). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12644181

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…