Dae Kil Cha

Title: The Innovations of Dae Kil Cha

Introduction

Dae Kil Cha is a notable inventor based in Suncheon-si, South Korea. He has made significant contributions to the field of image sensor technology. His work has led to the development of innovative devices that enhance image capturing capabilities.

Latest Patents

Dae Kil Cha holds a patent for "Image sensor devices having dual-gated charge storage regions therein." This patent describes an image sensor device that includes a dual-gated charge storage region within a substrate. The dual-gated charge storage region consists of first and second diodes within a common charge generating region. This charge generating region is designed to receive light incident on the surface of the image sensor device. The first and second diodes are responsive to respective first and second gate signals, which are active during non-overlapping time intervals.

Career Highlights

Dae Kil Cha is associated with Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of image sensor technology and contribute to advancements in this field.

Collaborations

Dae Kil Cha has collaborated with notable individuals in the industry, including Eric R Fossum and Young Gu Jin. These collaborations have further enriched his work and contributed to the development of innovative technologies.

Conclusion

Dae Kil Cha's contributions to image sensor technology exemplify the impact of innovation in the field. His patent and work at Samsung Electronics Co., Ltd. highlight his role as a significant inventor in advancing technology.