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For the Inventor, By the Inventor

Suncheon, South Korea

Dae-Kil Cha

This inventor holds 4 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2012-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dae-Kil Cha. Retrieved from https://idiyas.com/inventor/dae-kil-cha-7qbvybfu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4

% Patents Active = 75.0

Average Co-Inventor Count = 5.2

ph-index = 3

Forward Citations = 13(Granted Patents)


Company Filing History:

goldMedal4 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2012-2015

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4 patents (USPTO):Explore Patents
1. 8976277 - Image sensors (2015-03-10),
2. 8803273 - High sensitivity image sensors (2014-08-12),
3. 8546901 - High sensitivity image sensors including a single electron field effect transistor and methods of operating the same (2013-10-01),
4. 8154640 - Sub-pixels, unit pixels, image sensors and methods of operating the same (2012-04-10),

Title: Inventor Dae-Kil Cha: Revolutionizing Technology in Suncheon-si, KR

Introduction: Dae-Kil Cha is a visionary inventor based in Suncheon-si, South Korea, known for his groundbreaking contributions to the field of technology.

Latest Patents: Dae-Kil Cha holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With a career spanning over two decades, Dae-Kil Cha has worked with leading tech companies and research institutions, spearheading projects that have pushed the boundaries of innovation.

Collaborations: Throughout his career, Dae-Kil Cha has collaborated with top scientists, engineers, and researchers from around the world, fostering a culture of creativity and excellence in all his endeavors.

Conclusion: Inventor Dae-Kil Cha's relentless pursuit of innovation and his passion for creating technology that makes a difference continue to inspire the next generation of inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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