DaeJeon, South Korea

Dae Ho Shin

This inventor holds 1 USPTO granted patent. Top assignee: Adms Technology Co., Ltd.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dae Ho Shin. Retrieved from https://idiyas.com/inventor/dae-ho-shin-3kol0sab

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Dae Ho Shin: Innovator in Negative Resist Composition

Introduction

Dae Ho Shin is a prominent inventor based in DaeJeon, South Korea. He has made significant contributions to the field of liquid-crystal display technology through his innovative patent.

Latest Patents

Dae Ho Shin holds a patent for a negative resist composition. This composition is utilized in liquid-crystal display elements and includes a binder resin made from a copolymer of four predetermined monomers. It also features a (meth)acryl monomer with at least three (meth)acryl groups, another (meth)acryl monomer with one or two (meth)acryl groups, and a photo-initiator. The negative resist composition is designed to enhance manufacturing yield by exhibiting low brittleness during bonding processes. Its excellent physical properties, such as film retention, pattern stability, adhesion to substrates, chemical resistance, and flexibility, make it a valuable asset in the industry.

Career Highlights

Dae Ho Shin is currently associated with Adms Technology Co., Ltd. His work has been instrumental in advancing technologies related to display elements, showcasing his expertise and innovative spirit.

Collaborations

Some of his notable coworkers include Mi Sun Ryu and Jin Kyu Park, who contribute to the collaborative efforts at Adms Technology Co., Ltd.

Conclusion

Dae Ho Shin's contributions to the field of liquid-crystal display technology through his patent on negative resist composition highlight his role as an innovator. His work continues to influence advancements in manufacturing processes and product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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