The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Aug. 17, 2005
MI Sun Ryu, Daejeon, KR;
Bong Seok Moon, Daejeon, KR;
You Lee Pae, Daejeon, KR;
Hyuk-jin Cha, Daejeon, KR;
Su Hyun Lee, Busan, KR;
Young Hoe Kim, Daejeon, KR;
Seok Keun Kim, Daegu, KR;
Haeng-kyu Cho, Kongju-Si, KR;
Jin Kyu Park, Yesan-Sun, KR;
Dae Ho Shin, Deajeon, KR;
Mi Sun Ryu, Daejeon, KR;
Bong Seok Moon, Daejeon, KR;
You Lee Pae, Daejeon, KR;
Hyuk-Jin Cha, Daejeon, KR;
Su Hyun Lee, Busan, KR;
Young Hoe Kim, Daejeon, KR;
Seok Keun Kim, Daegu, KR;
Haeng-kyu Cho, Kongju-Si, KR;
Jin Kyu Park, Yesan-Sun, KR;
Dae Ho Shin, Deajeon, KR;
ADMS Technology Co., Ltd., Chungcheongnam-do, KR;
Abstract
A negative resist composition used in a liquid-crystal display element is disclosed. The negative resist composition according to the present invention includes a binder resin consisting of a copolymer including four predetermined monomers, a (meth)acryl monomer including at least 3 (meth)acryl groups, a (meth)acryl monomer including one or two (meth)acryl groups and a photo-initiator. The negative resist composition according to the present invention may be useful to significantly increase the manufacturing yield because it shows an extremely low brittleness during a bonding process or a hot process due to good physical properties such as film retention, pattern stability, adhesion to a substrate, and chemical resistance, as well as good flexibility upon formation of the pattern.