Da Yang

Title: Da Yang: Innovator in Optical Lithography

Introduction

Da Yang is a notable inventor based in Fishkill, NY (US). He has made significant contributions to the field of optical lithography, holding a total of 3 patents. His work focuses on advanced methods for designing optical photomasks, which are crucial in the semiconductor manufacturing process.

Latest Patents

One of Da Yang's latest patents is a method for designing optical lithography masks for directed self-assembly. This innovative method involves a computer system that designs an optical photomask to create a prepattern opening in a photoresist layer on a substrate. The photoresist layer and the prepattern opening are coated with a self-assembly material that undergoes directed self-assembly to form a specific pattern. The process includes generating a mask design shape from a target design shape, creating a sub-resolution assist feature design shape based on the mask design shape, and using a computer to evaluate if the resulting pattern meets specified dimensional and positional targets.

Career Highlights

Da Yang is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of innovation in optical lithography. His expertise in this area has led to advancements that enhance the efficiency and precision of semiconductor manufacturing.

Collaborations

Throughout his career, Da Yang has collaborated with talented individuals such as Joy Cheng and Kafai Lai. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Da Yang's contributions to optical lithography and his innovative methods for designing photomasks have established him as a key figure in the field. His work at IBM and collaborations with other professionals highlight the importance of teamwork in driving technological advancements.