The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Sep. 07, 2012
Joy Cheng, San Jose, CA (US);
Kafai Lai, Poughkeepsie, NY (US);
Wai-kin LI, Beacon, NY (US);
Young-hye NA, San Jose, CA (US);
Jed Walter Pitera, Portola Valley, CA (US);
Charles Thomas Rettner, San Jose, CA (US);
Daniel Paul Sanders, San Jose, CA (US);
Da Yang, Fishkill, NY (US);
Joy Cheng, San Jose, CA (US);
Kafai Lai, Poughkeepsie, NY (US);
Wai-Kin Li, Beacon, NY (US);
Young-Hye Na, San Jose, CA (US);
Jed Walter Pitera, Portola Valley, CA (US);
Charles Thomas Rettner, San Jose, CA (US);
Daniel Paul Sanders, San Jose, CA (US);
Da Yang, Fishkill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and a computer system for designing an optical photomask for forming a prepattern opening in a photoresist layer on a substrate wherein the photoresist layer and the prepattern opening are coated with a self-assembly material that undergoes directed self-assembly to form a directed self-assembly pattern. The methods includes: generating a mask design shape from a target design shape; generating a sub-resolution assist feature design shape based on the mask design shape; using a computer to generate a prepattern shape based on the sub-resolution assist feature design shape; and using a computer to evaluate if a directed self-assembly pattern of the self-assembly material based on the prepattern shape is within specified ranges of dimensional and positional targets of the target design shape on the substrate.