Albuquerque, NM, United States of America

Curt T Dundas



Average Co-Inventor Count = 5.3

ph-index = 8

Forward Citations = 187(Granted Patents)


Location History:

  • Kalispell, MT (US) (2002 - 2008)
  • Albuquerque, NM (US) (2008)

Company Filing History:


Years Active: 2002-2008

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13 patents (USPTO):Explore Patents

Title: Innovations by Curt T Dundas

Introduction

Curt T Dundas is a notable inventor based in Albuquerque, NM, with a remarkable portfolio of 13 patents. His work primarily focuses on advancements in microelectronic devices, showcasing his expertise in the field of semiconductor technology.

Latest Patents

Among his latest patents is a method for low-temperature annealing of metallization micro-structures in the production of microelectronic devices. This innovative method involves depositing a metal layer into recessed microstructures using an electroplating process that generates small metal grains, allowing for optimal filling of these structures. The subsequent annealing process occurs at temperatures below 100 degrees Celsius, and in some cases, even at ambient room temperature, facilitating grain growth that enhances electrical properties. Additionally, he has developed methods and apparatus for rinsing and drying workpieces, which utilize centrifugal force to apply rinsing and drying fluids effectively.

Career Highlights

Curt has worked with several companies, including Semitool, Inc. and Semitdol, Inc., where he contributed significantly to the development of innovative technologies in the semiconductor industry. His experience in these organizations has allowed him to refine his skills and expand his knowledge in microelectronic device production.

Collaborations

Throughout his career, Curt has collaborated with talented individuals such as Brian Aegerter and Gary L Curtis. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Curt T Dundas is a distinguished inventor whose contributions to microelectronic device technology have made a significant impact in the field. His innovative methods and collaborative spirit continue to inspire advancements in semiconductor technology.

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