Cuimei Diao

Title: Cuimei Diao: Innovator in Chemically-Amplified Photoresists

Introduction

Cuimei Diao is a prominent inventor based in Beijing, China. He has made significant contributions to the field of photoresist technology, particularly through his innovative work on negative chemically-amplified photoresists. His inventions are crucial for advancements in manufacturing integrated circuits, flat panel displays, and LED chips.

Latest Patents

Cuimei Diao holds a patent for a novel negative chemically-amplified photoresist and its imaging method. This patent, which is characterized by its unique composition, includes phenol resin, a photo-acid generator, a cross-linking agent, an alkaline additive, a sensitizing agent, and a photoresist solvent. The invention enhances the resolution and photospeed of photoresists, making it highly applicable in various high-tech manufacturing processes.

Career Highlights

Cuimei Diao is currently employed at Kempur Microelectronics, Inc., where he continues to develop innovative solutions in the field of microelectronics. His work has been instrumental in pushing the boundaries of photoresist technology, contributing to the efficiency and effectiveness of electronic manufacturing.

Collaborations

Cuimei has collaborated with notable colleagues, including Jia Sun and Xin Chen, who have supported his research and development efforts. Their teamwork has fostered an environment of innovation and creativity within the company.

Conclusion

Cuimei Diao's contributions to the field of photoresist technology exemplify the impact of innovative thinking in advancing electronic manufacturing. His work not only enhances the capabilities of current technologies but also paves the way for future advancements in the industry.