Cristian Siladie

Title: Cristian Siladie: Innovator in Substrate Processing Technology

Introduction

Cristian Siladie is a notable inventor based in Castro Valley, CA (US). He has made significant contributions to the field of substrate processing technology, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of substrate support systems.

Latest Patents

One of Cristian's latest patents is titled "Variable depth edge ring for etch uniformity control." This invention involves a method of operating a substrate support that calculates a desired pocket depth based on process parameters. The method allows for selective control of an actuator to adjust the distance between the edge ring and the substrate, ensuring optimal processing conditions. Another significant patent is "Substrate processing chamber including multiple gas injection points and dual injector." This invention features a gas injector with a unique design that allows gas to flow into a processing chamber without mixing, enhancing the precision of substrate processing.

Career Highlights

Cristian Siladie is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His innovative work has contributed to advancements in substrate processing technologies, making him a valuable asset to his team.

Collaborations

Cristian has collaborated with notable coworkers such as Ivelin A Angelov and Dean Jay Larson. Their combined expertise has fostered a collaborative environment that drives innovation within their projects.

Conclusion

Cristian Siladie is a prominent inventor whose work in substrate processing technology has led to multiple patents and significant advancements in the field. His contributions continue to influence the industry and inspire future innovations.