Bucharest, Romania

Cristian Savlovschi

This inventor holds 1 USPTO granted patent. Top assignee: Nxp USA, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cristian Savlovschi. Retrieved from https://idiyas.com/inventor/cristian-savlovschi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Cristian Savlovschi: Innovator in Radar Technology

Introduction

Cristian Savlovschi is a notable inventor based in Bucharest, Romania. He has made significant contributions to the field of radar technology, particularly in the area of interference mitigation. His innovative approach has led to the development of a unique patent that addresses challenges faced by Frequency-Modulated Continuous-Wave (FMCW) radars.

Latest Patents

Cristian holds a patent for "Frequency-Modulated Continuous-Wave (FMCW) radar interference mitigation using an Autoregressive Moving Average (ARMA) model." This patent describes systems and methods for mitigating interference in FMCW radars. The invention includes a device that utilizes a processor and memory to execute program instructions. These instructions enable the device to receive and analyze radar frames, reconstructing zeroed samples to mitigate interference caused by other radars.

Career Highlights

Cristian is currently employed at NXP USA, Inc., where he continues to work on advancing radar technology. His expertise in the field has positioned him as a valuable asset to his company and the broader technological community.

Collaborations

Cristian collaborates with talented individuals such as Filip Alexandru Rosu and Tudor Bogatu. Their combined efforts contribute to the innovative projects at NXP USA, Inc.

Conclusion

Cristian Savlovschi's work in radar technology exemplifies the spirit of innovation. His contributions through patents and collaborations highlight the importance of advancing technology for practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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