This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Denton Vacuum, LLC. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Craig A Outten: Innovator in Plasma Ion Source Technology
Introduction
Craig A Outten is a notable inventor based in Rydal, Pennsylvania, recognized for his contributions to the field of plasma ion source technology. With a total of two patents to his name, Outten has made significant advancements that enhance the efficiency and functionality of plasma ion sources.
Latest Patents
Outten's latest patents include the "Linearized Energetic Radio-Frequency Plasma Ion Source" and the "Self-Neutralized Radio Frequency Plasma Ion Source." The first patent describes a plasma ion source that features a plasma chamber body with an inlet for introducing feed gas. This design allows for the generation of a quasi-neutral plasma ion beam through a combination of RF voltage and pulsed DC voltage. The second patent outlines a plasma generation unit that sustains a plasma within a discharge chamber, utilizing an ignition unit to stimulate ionization and an ion extraction unit to produce a stable plasma ion beam.
Career Highlights
Throughout his career, Craig A Outten has worked with Denton Vacuum, LLC, where he has applied his expertise in plasma technology. His work has contributed to the development of innovative solutions in the field, showcasing his commitment to advancing plasma ion source technology.
Collaborations
Outten has collaborated with David Konopka, further enhancing the research and development efforts in plasma technology. Their partnership has led to significant advancements in the field.
Conclusion
Craig A Outten's innovative work in plasma ion source technology has established him as a key figure in the industry. His patents reflect a deep understanding of plasma dynamics and contribute to the ongoing evolution of this technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile