The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Oct. 04, 2018
Applicant:

Denton Vacuum, Llc, Moorestown, NJ (US);

Inventors:

Craig A. Outten, Rydal, PA (US);

David Konopka, Bensalem, PA (US);

Assignee:

DENTON VACUUM, LLC, Moorestown, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/46 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01); H01J 37/08 (2013.01); H01J 37/3211 (2013.01); H01J 37/32091 (2013.01); H05H 1/46 (2013.01); H05H 2001/4667 (2013.01);
Abstract

A plasma ion source includes a plasma generation unit comprising a plasma discharge chamber adapted to generate and sustain a plasma confined therein, a gas distribution unit adapted to deliver a working gas into an interior of the plasma discharge chamber, an ignition unit adapted to stimulate ionization of the working gas to generate a stable plasma, an electrode bias unit configured to apply an electrostatic potential to charged species in the plasma discharge, and an ion extraction unit configured to accelerate the charged species out of the ion extraction unit to generate a quasi-neutral plasma ion beam. The plasma ion source further includes a vacuum integrated matching network coupled with the plasma generation and electrode bias units. The matching network resides with the plasma generation and electrode bias units in a vacuum chamber during operation of the plasma ion source.


Find Patent Forward Citations

Outten, Craig. (2020). Self-neutralized radio frequency plasma ion source (U.S. Patent No. 10573495). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10573495

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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