This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Dupont Electronic Materials International, LLC. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Conner A. Hoelzel: Innovator in Photoresist Compositions
Introduction
Conner A. Hoelzel is a notable inventor based in Brookline, MA (US). He has made significant contributions to the field of electronic materials, particularly in the development of photoresist compositions. His innovative work has led to the granting of a patent that showcases his expertise and creativity.
Latest Patents
Conner A. Hoelzel holds a patent for "Compounds and photoresist compositions including the same." This patent describes a compound represented by a specific formula, where various groups and integers define its chemical structure. The compound is characterized as non-polymeric, which adds to its uniqueness and potential applications in electronic materials.
Career Highlights
Conner is currently employed at DuPont Electronic Materials International, LLC, where he continues to push the boundaries of innovation in his field. His work at DuPont has allowed him to collaborate with other talented professionals and contribute to cutting-edge research and development.
Collaborations
Some of Conner's coworkers include Li Cui and Emad Aqad. Their collaboration fosters a creative environment that enhances the development of new technologies and solutions in electronic materials.
Conclusion
Conner A. Hoelzel is a dedicated inventor whose work in photoresist compositions exemplifies innovation in electronic materials. His contributions are paving the way for advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile