This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Rohm & Haas Electronic Materials LLC. Active years: 2023.
Company Filing History:
Years Active: 2023
Title: Colin Liu - Innovator in Photoresist Technology
Introduction
Colin Liu is a notable inventor based in Shrewsbury, MA (US). He has made significant contributions to the field of electronic materials, particularly in photoresist technology. His innovative work has led to the development of a unique patent that enhances pattern formation methods.
Latest Patents
Colin Liu holds a patent for "Photoresist pattern trimming compositions and pattern formation methods." This patent involves photoresist pattern trimming compositions that comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system. The aromatic sulfonic acid is defined by a specific general formula, which includes various substituents that enhance the functionality of the compositions. This invention is crucial for improving the precision and efficiency of pattern formation in electronic applications. He has 1 patent to his name.
Career Highlights
Colin Liu is currently employed at Rohm & Haas Electronic Materials LLC, where he applies his expertise in developing advanced electronic materials. His work at the company has positioned him as a key player in the innovation of photoresist technologies.
Collaborations
Colin collaborates with talented coworkers, including Irvinder Kaur and Xisen Hou. Their combined efforts contribute to the advancement of electronic materials and the development of new technologies.
Conclusion
Colin Liu's contributions to photoresist technology exemplify the impact of innovative thinking in the field of electronic materials. His patent and work at Rohm & Haas Electronic Materials LLC highlight his role as a significant inventor in this industry.