Company Filing History:
Years Active: 2022
Title: Inventor Spotlight: Colin D. Landon
Introduction
Colin D. Landon, based in Portland, Oregon, is an innovative inventor renowned for his contributions to semiconductor technology. His expertise has led to the development of advanced integrated circuits, playing a crucial role in the progression of modern electronics.
Latest Patents
Colin holds a patent for a "Pedestal fin structure for stacked transistor integration," which details stacked transistor structures and methods for their formation. In his invention, a unique stacked transistor structure features a wide central pedestal region paired with at least one narrower channel region positioned above or below. The architecture of these regions is non-planar and incorporates various semiconductor elements such as fins, nanowires, and nanoribbons. Notably, the outermost sidewalls of the channel regions are designed to align with the pedestal region, adding to the innovation's structural coherence. His work aims to enhance the efficiency and functionality of top and bottom transistor structures, specifically NMOS and PMOS technologies.
Career Highlights
Colin D. Landon is associated with Intel Corporation, a global leader in semiconductor manufacturing. His work at Intel reflects his commitment to pushing the boundaries of technology, making significant strides in device performance and integration.
Collaborations
Throughout his career, Colin has collaborated with talented professionals such as Aaron D. Lilak and Rishabh Mehandru. These partnerships highlight his ability to work within a dynamic team environment, fostering a culture of innovation and shared knowledge.
Conclusion
Colin D. Landon's contributions to the field of electronics through his inventive spirit and collaborative efforts continue to impact the landscape of semiconductor technology. His patent demonstrates not only technical skill but also a forward-thinking approach in developing systems that support the future of electronic devices. The innovation showcased in his work at Intel marks a significant addition to the ongoing evolution in this critical industry.