Company Filing History:

18 out of 164,108

International Business Machines Corporation

patents

1 out of 2,636

Hitachi Global Storage Technologies Netherlands B.v.

patents

Years Active: 1979-2006

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19 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 7123443 - Self-aligned void filling for mushroomed plating (2006-10-17),

2. 6972928 - Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing (2005-12-06),

3. 6770209 - Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing (2004-08-03),

4. 6631546 - Self-aligned void filling for mushroomed plating (2003-10-14),

5. 6346183 - Use of thin carbon films as a bottom anti-reflective coating in manufacturing magnetic heads (2002-02-12),

6. 6074566 - Thin film inductive write head with minimal organic insulation material (2000-06-13),

7. 6049443 - Suspension bent by stressed patch (2000-04-11),

8. 5963397 - Ceramic suspension bent by stressed patch (1999-10-05),

9. 5885750 - Tantalum adhesion layer and reactive-ion-etch process for providing a (1999-03-23),

10. 5864241 - Magnetic transducer with wear indicator in a magnetic data storage system (1999-01-26),

11. 5802701 - Method of making an integrated suspension, actuator arm and coil assembly (1998-09-08),

12. 5734519 - Contact magnetic recording disk file with improved head assembly (1998-03-31),

13. 5665251 - RIE image transfer process for plating (1997-09-09),

14. 5600880 - Process for forming vertical gap in a thin film magnetic transducer (1997-02-11),

15. 5539596 - Integrated suspension, actuator arm and coil assembly with common (1996-07-23),

Title: Clinton David Snyder: Innovator in Thin Film Magnetic Technology

Introduction

Clinton David Snyder is a notable inventor residing in Los Gatos, California. With a remarkable portfolio of 19 patents, he has made significant contributions to the field of thin film magnetic technologies. His innovative approaches have advanced the understanding and functionality of magnetic devices.

Latest Patents

Among his latest patents, Clinton David Snyder has developed "Self-aligned void filling for mushroomed plating." This invention addresses the challenges of voids and redeposition problems in overplated components, particularly in thin film magnetic heads. The technology involves encapsulating a device with an enlarged mushroom head structure to ensure that no voids exist under the overhang of the hard baked resist layer.

Another significant patent is "Isotropic deposition for trench narrowing of features to be created by reactive ion etch processing." This isotropic deposition method offers a new approach for narrowing trenches in thin film magnetic write head features, which are essential for enhancing the performance of magnetic devices. By strategically applying a spacer layer, this process improves the precision of trench widths in manufacturing.

Career Highlights

Clinton David Snyder has an extensive career in major technology companies. He has worked with leading organizations such as IBM and Hitachi Global Storage Technologies Netherlands B.V. His innovative contributions within these firms have played a vital role in the advancement of magnetic storage technologies.

Collaborations

Throughout his career, Clinton has collaborated with fellow innovators. Notable coworkers include Richard Hsiao and Hugo Alberto Santini. These collaborations have facilitated the exchange of ideas and enhanced the development of groundbreaking technologies in the field.

Conclusion

Clinton David Snyder is a pioneering inventor whose work has significantly impacted thin film magnetic technology. His patents showcase his expertise and commitment to innovation, setting a high standard in the industry. As technology continues to evolve, the contributions of inventors like Snyder will undoubtedly lead to further advancements and inspire future innovations.

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