Fremont, CA, United States of America

Clifford F Knollenberg

This inventor holds 10 USPTO granted patents and 2 EPO patents. Top assignee: Palo Alto Research Center Inc.. Active years: 2009-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Clifford F Knollenberg. Retrieved from https://idiyas.com/inventor/clifford-f-knollenberg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 70.0


Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Fremont, CA (US) (2010 - 2014)
  • San Bruno, CA (US) (2014)
  • Mountain View, CA (US) (2009 - 2015)

Company Filing History:


Years Active: 2009-2015

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10 patents (USPTO):Explore Patents

Title: **Innovations of Clifford F. Knollenberg**

Introduction

Clifford F. Knollenberg is a notable inventor based in Fremont, California, who has made significant contributions to the field of electroplating and semiconductor technology. With a total of 10 patents to his name, Knollenberg has demonstrated a remarkable capacity for innovation, leading to advancements in the manufacturing processes of electronic components.

Latest Patents

Among his most recent inventions is a patent for "Fabrication for Electroplating Thick Metal Pads." This method involves creating a seed region on a substrate, then forming a ground plane, which is kept electrically isolated from the seed region. The process of electroplating follows, enabling the formation of a structure that includes a substrate, a passivation layer, and at least one electroplated metal region that maintains contiguous contact with the passivation layer. This innovation culminates in a device featuring bond pads and solder beads that connect components to these pads efficiently.

Another significant patent is his work on "Laser-Induced Flaw Formation in Nitride Semiconductors." This method enables the selective decomposition of regions within a thin film structure to create flaws in a predetermined pattern. The induced flaws concentrate stress in the film layer during a stress-inducing operation, ultimately allowing for controlled fracturing of the material in accordance with the designed pattern.

Career Highlights

Clifford F. Knollenberg currently works at the Palo Alto Research Center Incorporated (PARC), where he continues to push the boundaries of innovation in technology. His career is marked by a commitment to developing advanced manufacturing processes that enhance the functionality and durability of electronic devices.

Collaborations

Throughout his career, Knollenberg has collaborated with several esteemed colleagues, including Christopher L. Chua and Mark Teepe. These partnerships have fostered collective advancements in their respective fields, highlighting the importance of teamwork in innovation.

Conclusion

Clifford F. Knollenberg stands out as a key inventor in the technology sector, particularly in electroplating and semiconductor manufacturing. His contributions, consisting of 10 patents, reflect his dedication to advancing the field through innovative methodologies and collaborative efforts with fellow researchers. His work not only influences current technology but also paves the way for future developments in electronic manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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