Zurich, Switzerland

Claudiu Falub

This inventor holds 4 USPTO granted patents and 1 published patent application, plus 1 CIPO patent and 1 EPO patent. Top assignees: Depuy Synthes Products, Inc., Evatec Ag. Active years: 2015-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Claudiu Falub. Retrieved from https://idiyas.com/inventor/claudiu-falub

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0


 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2023

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Claudiu Falub

Introduction

Claudiu Falub is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of magnetron sputtering, holding a total of 4 patents. His work has advanced the understanding and application of this technology in various industries.

Latest Patents

Falub's latest patents focus on methods and apparatus for magnetron sputtering. In these patents, a magnetron magnetic field is generated within a reaction space. Additionally, a further magnetic field is created in the reaction space, resulting in a resultant magnetic field that has a directional component parallel to a target plane. This component is larger than the directional component of the magnetron magnetic field parallel to the target plane in the reaction space. These innovations enhance the efficiency and effectiveness of magnetron sputtering processes.

Career Highlights

Throughout his career, Claudiu Falub has worked with prominent companies such as Depuy Synthes Products, Inc. and Evatec AG. His experience in these organizations has allowed him to apply his innovative ideas and contribute to the development of advanced technologies.

Collaborations

Falub has collaborated with notable professionals in his field, including Roland Hauert and Goetz Thorwarth. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Claudiu Falub's contributions to the field of magnetron sputtering and his collaborations with industry professionals highlight his role as a significant inventor. His work continues to influence advancements in technology and innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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