Depuy Synthes Products, Inc.

Evatec Ag

Synthes Gmbh

Claudiu Falub

Cyril Voisard

Goetz Thorwarth

Hartmut Rohrmann

Ulrich Mueller

Martin Bless

Roland Hauert

In a magnetron sputtering reaction space a magnetron magnetic field is generated. A further magnetic field is generated in the reaction space whereby a resultant magnetic field has a directional component parallel to a target plane which is larger than the directional component of the magnetron magnetic field parallel to the target plane in the reaction space.

Methods of and apparatus for magnetron sputtering

A coating for a CoCrMo substrate including a first layer located directly on the substrate and including Ta(CoCrMo), a second layer located directly on the first layer and including tantalum, a third layer located directly on the second layer and including tantalum carbide, and a fourth layer located directly on the third layer and including diamond-like carbon (DLC).

Coating for a CoCrMo substrate

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Zurich, Switzerland

Claudiu Falub