Location History:
- Palo Alto, CA (US) (2003 - 2004)
- Mountain View, CA (US) (2005 - 2007)
Company Filing History:
Years Active: 2003-2007
Title: The Innovative Contributions of Claudio L Rampoldi
Introduction
Claudio L Rampoldi is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of metrology, particularly through his innovative patents. With a total of 4 patents to his name, Rampoldi's work has advanced the accuracy and efficiency of measurement technologies.
Latest Patents
One of Rampoldi's latest patents is an "Eddy current sensor with concentric confocal distance sensor." This metrology instrument integrates an eddy current sensor with a confocal distance sensor, enhancing the precision of measurements by accurately determining the vertical placement of the eddy current probe relative to the sample surface. This innovation minimizes errors and maximizes throughput by reducing the necessary stage travel for measurements.
Another significant patent is "Leveling a measured height profile." This invention involves a metrology tool that generates a height profile of a sample, which includes a film on a substrate. By measuring the thickness of the film at multiple locations, the apparatus levels the height profile to reduce tilt errors before calculating step heights. This method ensures more accurate results in height profiling.
Career Highlights
Claudio L Rampoldi is currently employed at Nanometrics Inc., where he continues to develop cutting-edge metrology solutions. His work has been instrumental in improving measurement techniques that are crucial for various applications in technology and manufacturing.
Collaborations
Rampoldi has collaborated with talented individuals such as Jaime Poris and Pablo I Rovira. These partnerships have fostered a creative environment that encourages innovation and the development of advanced measurement technologies.
Conclusion
Claudio L Rampoldi's contributions to metrology through his patents demonstrate his commitment to innovation and precision in measurement technologies. His work continues to influence the field and improve the accuracy of various applications.