Heidenheim, Germany

Claudia Woersching

This inventor holds 1 USPTO granted patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Claudia Woersching. Retrieved from https://idiyas.com/inventor/claudia-woersching

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Claudia Woersching: Innovator in Lithography Systems

Introduction

Claudia Woersching is a notable inventor based in Heidenheim, Germany. She has made significant contributions to the field of lithography systems, particularly in the tracking and identification of components used in semiconductor lithography.

Latest Patents

Woersching holds a patent for a "Method for the tracking and identification of components of lithography systems, and lithography system." This innovative method involves equipping components with transponders that store data related to each component. The transponders can wirelessly receive signals from a reader and respond with the stored data. This data is recorded during the production of the component, the lithography system, or after the system's start-up.

Career Highlights

Claudia Woersching is currently employed at Carl Zeiss SMT GmbH, a leading company in the optics and materials technology sector. Her work focuses on enhancing the efficiency and reliability of lithography systems, which are crucial for semiconductor manufacturing.

Collaborations

One of her notable collaborators is Michael Kamp-Froese, with whom she has worked closely on various projects related to lithography technology.

Conclusion

Claudia Woersching's contributions to the field of lithography systems exemplify her innovative spirit and dedication to advancing technology. Her patent reflects her commitment to improving the efficiency of semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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