Claude Johnson, Jr

Title: Claude Johnson, Jr: Innovator in Microelectronic Fabrication

Introduction

Claude Johnson, Jr. is a notable inventor based in Yorktown Heights, NY (US). He has made significant contributions to the field of microelectronics, holding a total of 3 patents. His work focuses on innovative fabrication methods that enhance the performance and efficiency of electronic devices.

Latest Patents

One of his latest patents is a fabrication method for vacuum microelectronic devices. This method involves creating a microstructure with a vacuum-sealed cavity by forming an aluminum-filled cavity in silicon material and subsequently heating the structure. This process allows the aluminum to be absorbed into the silicon, leaving a vacuum in the cavity. In one embodiment, a cavity is etched into a silicon wafer, filled with aluminum, and then covered with a silicon dioxide layer before heating to produce the vacuum cavity. Another significant patent is a method for fabricating non-reflective semiconductor surfaces. This process utilizes a differential reactive ion etching technique that significantly reduces the reflectivity of silicon, enhancing its performance in various applications.

Career Highlights

Claude Johnson, Jr. is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of microelectronics. His work has been instrumental in advancing the technology used in modern electronic devices.

Collaborations

Throughout his career, Claude has collaborated with esteemed colleagues, including Robert R Wilbarg and Donald R Dyer. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Claude Johnson, Jr. is a prominent figure in the field of microelectronics, with a focus on innovative fabrication methods that improve device performance. His contributions through his patents and work at IBM highlight his commitment to advancing technology in this critical area.