Claude Frantz

Title: Claude Frantz: Innovator in Self-Stabilizing Deposition Technology

Introduction

Claude Frantz is a notable inventor based in Laxou, US. He has made significant contributions to the field of material science, particularly in the area of self-stabilizing deposition techniques. His innovative approach has led to the development of a unique method that enhances the efficiency of compound deposition processes.

Latest Patents

Frantz holds a patent for a "Method for self-stabilizing deposition of a stoichiometric compound by reactive sputtering using a cold plasma." This method involves supplying a reactive gas to a target while cyclically adjusting the instantaneous power applied to the target. The frequency of these adjustments is low enough to facilitate a reaction between the target material and the reactive gas on the target's surface. The resulting product is then sputtered onto a substrate, allowing for self-stabilizing deposition of the reaction product.

Career Highlights

Claude Frantz is associated with the Institut National Polytechnique De Lorraine, where he has been able to apply his expertise in innovative deposition methods. His work has garnered attention for its potential applications in various industries, including electronics and materials engineering.

Collaborations

Frantz has collaborated with notable colleagues such as Bruno Stauder and Frederic Perry. These partnerships have contributed to the advancement of research in the field and have fostered a collaborative environment for innovation.

Conclusion

Claude Frantz's contributions to the field of self-stabilizing deposition technology exemplify the impact of innovative thinking in material science. His patent and collaborative efforts highlight the importance of research and development in advancing technological applications.