Institut National Polytechnique De Lorraine

Claude Frantz

Frederic Perry

Bruno Stauder

Philippe Pigeat

Gerard Henrion

Alain Billard

Method for self-stabilizing deposition of a stoichiometric compound by reactive sputtering using a cold plasma. A reactive gas is supplied to a target, the instantaneous power applied to the target is cyclically reduced and increased at a frequency sufficiently low that a reaction between the target material and the reactive gas takes place on the surface of the target, and the product of the reaction is then sputtered off the surface of the target and onto a substrate. The alternating decrease and increase of the instantaneous power applied to the target at low frequency provides for self-stabilizing deposition of the reaction product on the substrate.

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Laxou, United States of America

Claude Frantz