Delft, Netherlands

Clara Inés Osorio Tamayo

This inventor holds 1 USPTO granted patent. Top assignee: Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Clara Inés Osorio Tamayo. Retrieved from https://idiyas.com/inventor/clara-inés-osorio-tamayo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Clara Inés Osorio Tamayo and a Diamond-Based Metrology Invention.

Introduction

Clara Inés Osorio Tamayo is an inventor associated with Delft, the Netherlands, and Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek TNO. Her patent work describes a metrology device and method for measuring characteristics of a sample.

Latest Patents

The provided information lists one patent for Osorio Tamayo: “Metrology Device and Method.” The invention uses a probe with a diamond tip containing one or more nitrogen-vacancy centers. A radiation source excites the tip, causing it to emit fluorescent light, while a scanning mechanism moves the probe along the sample’s surface. An optical sensor measures the fluorescence intensity, and a signal processor uses that signal to determine at least one characteristic of a feature in the sample.

Career Highlights

The listed patent reflects work at the intersection of metrology, optical sensing, and diamond-based technology. Its approach uses fluorescence from nitrogen-vacancy centers to support measurements of sample features.

Collaborations

Kodai Hatakeyama is identified as Osorio Tamayo’s coworker. The provided information does not specify their roles in the patent or describe the nature of their collaboration.

Conclusion

Clara Inés Osorio Tamayo’s listed invention applies fluorescent sensing with a diamond probe to metrology, offering a method for determining characteristics of features on a sample.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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