Chuoluopeng

Title: The Innovative Contributions of Chuoluopeng

Introduction

Chuoluopeng is a notable inventor based in Beijing, China. He has made significant contributions to the field of exposure technology, particularly with his innovative designs that address existing limitations in the industry. His work has garnered attention for its potential to enhance the resolution capabilities of mask plates.

Latest Patents

Chuoluopeng holds a patent for a mask plate, which is designed to overcome the resolution limitations caused by diffraction effects. The invention includes a pattern structure that features both a light-blocking region and a light-transmitting region. Additionally, it incorporates a total reflection structure on the light-exiting side of the pattern structure. This total reflection structure consists of a high refraction layer and a first low refraction layer, arranged sequentially to optimize performance. The refractive index of the high refraction layer is greater than that of the first low refraction layer, enhancing the overall functionality of the mask plate.

Career Highlights

Throughout his career, Chuoluopeng has worked with prominent companies in the technology sector. Notably, he has been associated with BOE Technology Group Co., Ltd. and Ordos Yuansheng Optoelectronics Co., Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in the field.

Collaborations

Some of his notable coworkers include Chaobo Zhang and Liangliang Liu. Their collaboration has likely fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Chuoluopeng's contributions to the field of exposure technology, particularly through his patented mask plate, demonstrate his commitment to innovation. His work not only addresses existing challenges but also paves the way for future advancements in the industry.