Company Filing History:
Years Active: 2014-2020
Title: Innovations of Chung-Yuan Yang
Introduction
Chung-Yuan Yang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and functionality of metal-oxide-semiconductor field-effect transistors (MOSFETs) and testing methodologies for semiconductor wafers.
Latest Patents
One of his latest patents is for a metal-oxide-semiconductor field-effect transistor with a spacer over the gate. This invention includes a substrate, a source and a drain integrated within the substrate, and a gate electrode positioned between the source and drain. The design features an inner spacer that is partially over the gate electrode and an outer spacer adjacent to the sidewall of the gate electrode. This innovation aims to improve the performance and reliability of MOSFETs.
Another notable patent involves methods and apparatus for testing pads on wafers. This invention discloses methods for sharing test pads among function blocks under test within multiple layers of a die. The semiconductor wafer comprises a first die and a second die separated by a scribe line. The design includes multiple test pads that facilitate testing across different function blocks, thereby reducing the area required for scribe lines on the wafer.
Career Highlights
Chung-Yuan Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing semiconductor technologies and improving testing methodologies.
Collaborations
He has collaborated with notable colleagues such as Jen-Pan Wang and Jiun-Jie Huang, contributing to various projects that enhance semiconductor performance and testing efficiency.
Conclusion
Chung-Yuan Yang's innovative contributions to semiconductor technology, particularly in MOSFET design and testing methodologies, underscore his importance in the field. His patents reflect a commitment to advancing technology and improving efficiency in semiconductor manufacturing.