Hsinchu, Taiwan

Chung-Yuan Wu

This inventor holds 2 USPTO granted patents. Top assignee: Hermes-Epitek Corporation. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-Yuan Wu. Retrieved from https://idiyas.com/inventor/chung-yuan-wu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017

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2 patents (USPTO):Explore Patents

Title: Chung-Yuan Wu: Innovator in Wafer and Thin Film Technology

Introduction

Chung-Yuan Wu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of wafer and thin film technology, holding a total of 2 patents. His innovative work has advanced the methods used in vapor deposition systems and thin film stress measurement.

Latest Patents

Wu's latest patents include a "System and method for controlling wafer and thin film surface temperature." This invention discloses a vapor deposition system that utilizes a susceptor carrying multiple wafer holders. Each holder rotates around its axis while the susceptor revolves around a central axle. A carrier gas is heated to form a thin film on the wafer's surface, while an isothermal plate measures the temperature of the wafer's rear surface. This innovative approach allows for precise temperature control during the deposition process.

Another notable patent is the "Apparatus and method for curvature and thin film stress measurement." This apparatus employs two light sources and a detector to measure the curvature of a specimen. By analyzing the distance between the spots of light beams reflected from the specimen, the curvature can be accurately calculated. This method enhances the understanding of thin film stress, which is crucial for various applications in semiconductor manufacturing.

Career Highlights

Chung-Yuan Wu is currently employed at Hermes-Epitek Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His work has been instrumental in improving the efficiency and effectiveness of wafer processing techniques.

Collaborations

Throughout his career, Wu has collaborated with notable colleagues, including Bu-Chin Chung and Robert Champetier. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Chung-Yuan Wu's contributions to wafer and thin film technology have established him as a key figure in the field. His patents reflect a commitment to advancing semiconductor manufacturing processes, and his work continues to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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