Location History:
- Taichung, TW (2007 - 2009)
- Taipei, TW (2010 - 2015)
- New Taipei, TW (2015 - 2020)
Company Filing History:
Years Active: 2007-2020
Title: Innovations of Chung-Yi Cheng
Introduction
Chung-Yi Cheng is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemical-mechanical polishing, holding a total of eight patents. His work focuses on improving the efficiency and effectiveness of polishing processes used in various industries.
Latest Patents
Cheng's latest patents include innovative designs for chemical-mechanical polishing abrasive pad conditioners. One of his notable inventions is a CMP abrasive pad conditioner that features a bottom substrate and an intermediate layer with a hollow portion and an annular portion. This design includes a diamond film that forms abrasive projections, enhancing the polishing process. Another significant patent involves a chemical mechanical polishing conditioner that addresses thermal deformation issues during the curing process, thereby improving surface flatness.
Career Highlights
Throughout his career, Chung-Yi Cheng has worked with notable companies such as Lite-On Technology Corporation and Kinik Company. His experience in these organizations has allowed him to develop and refine his inventions, contributing to advancements in polishing technologies.
Collaborations
Cheng has collaborated with talented individuals in his field, including Jui-Lin Chou and Chia Chun Wang. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Chung-Yi Cheng's contributions to the field of chemical-mechanical polishing are noteworthy, with his eight patents reflecting his dedication to innovation. His work continues to influence the industry and improve polishing processes worldwide.