Chung-Yen Chien

Title: Innovations of Chung-Yen Chien

Introduction

Chung-Yen Chien is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on the development of advanced semiconductor devices and fabrication methods.

Latest Patents

Chien's latest patents include a semiconductor device and its fabrication method. This semiconductor device features a substrate with a first conductivity type and an epitaxial layer. The design incorporates a first trench and a second trench within the epitaxial layer, along with body regions of a second conductivity type positioned on either side of the first trench. Additionally, the device includes source regions of the first conductivity type, an electrode in the first trench, and a source contact structure that connects the source regions.

Another notable patent involves methods for forming semiconductor devices. This method outlines the formation of multiple trenches in the substrate, the creation of an isolation oxide layer, and the deposition of shield polysilicon. The process includes several etching and removal steps to achieve the desired structure, culminating in an inter-poly oxide layer with a concave top surface.

Career Highlights

Chung-Yen Chien is currently employed at Vanguard International Semiconductor Corporation, where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

Chien has collaborated with notable coworkers, including Sheng-Wei Fu and Chung-Yeh Lee, further enhancing the innovative environment at his workplace.

Conclusion

Chung-Yen Chien's work in semiconductor technology exemplifies the spirit of innovation. His patents and contributions significantly impact the field, showcasing his dedication to advancing technology.