The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Oct. 23, 2023
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Sheng-Wei Fu, Taoyuan City, TW;

Chung-Yen Chien, Taoyuan City, TW;

Chung-Yeh Lee, Hsinchu County, TW;

Fu-Hsin Chen, Hsinchu County, TW;

Chen-Dong Tzou, Taipei City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 64/23 (2025.01); H01L 21/762 (2006.01); H10D 30/01 (2025.01); H10D 30/63 (2025.01); H10D 62/10 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 64/252 (2025.01); H01L 21/76224 (2013.01); H10D 30/025 (2025.01); H10D 30/63 (2025.01); H10D 62/10 (2025.01); H10D 64/513 (2025.01);
Abstract

A semiconductor device includes a substrate having a first conductivity type and an epitaxial layer disposed on the substrate. A first trench and a second trench are disposed in the epitaxial layer. A first body region and a second body region both having a second conductivity type are disposed in the epitaxial layer, and located on two sides of the first trench, respectively. A first source region and a second source region both having the first conductivity type are disposed on the first body region and the second body region, respectively. A first electrode is disposed in the first trench. A source contact structure includes a first portion disposed in the first trench and is electrically connected to the first source region and the second source region. A first gate is disposed in the second trench.


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