Location History:
- Chung-Li, TW (2002)
- Padeh, TW (2007)
- Taoyuan Hsien, TW (2002 - 2009)
Company Filing History:
Years Active: 2002-2009
Title: Innovations of Chung-Wang Chou
Introduction
Chung-Wang Chou is a notable inventor based in Taoyuan Hsien, Taiwan. He has made significant contributions to the field of plasma display technology, holding a total of 5 patents. His work has advanced the design and functionality of plasma display panels, showcasing his expertise and innovative spirit.
Latest Patents
Chou's latest patents include a method of manufacturing barrier ribs for a plasma display panel. This invention provides a PDP structure that includes a first substrate, a second substrate, and a Waffle barrier rib structure located between them. The Waffle barrier rib structure consists of three first barrier ribs of varying widths and several second barrier ribs that are perpendicular to the first. This design allows for the formation of discharge spaces, facilitating gas passage between the sealed substrates. Another notable patent involves a plasma display panel with bumps on barrier ribs. This method outlines the process of forming elongated electrodes on a first substrate, followed by the creation of an overcoat layer and a shaped layer. Bumps are then formed to define passages for air flow in the discharge space, simplifying the alignment process.
Career Highlights
Chung-Wang Chou has worked with prominent companies in the display technology sector, including Chunghwa Picture Tubes, Ltd. and AU Optronics Corporation. His experience in these organizations has contributed to his development as an inventor and has allowed him to collaborate on various innovative projects.
Collaborations
Chou has collaborated with talented individuals such as Hsu-Pin Kao and Ching-Hui Lin. These partnerships have likely enriched his work and led to further advancements in plasma display technology.
Conclusion
Chung-Wang Chou's contributions to the field of plasma display technology are significant and impactful. His innovative patents and collaborations reflect his dedication to advancing this technology. His work continues to influence the industry and inspire future innovations.