The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2002
Filed:
Sep. 19, 2001
Chien-Ho Lin, Hsinchu, TW;
Chung-Wang Chou, Taoyuan Hsien, TW;
Au Optronics Corp., Hsinchu, TW;
Abstract
A method of forming barrier ribs used in plasma display panels (PDP) is provided. The barrier ribs are formed on a substrate, and the substrate includes a dielectric layer and a rib material layer formed on the dielectric layer. First, a first bottom pattern layer, a second bottom pattern layer and a third bottom pattern layer are formed on the rib material layer. These bottom pattern layers have the same width and are spaced apart to each other with the same distance. Second, a first middle pattern layer, a second middle pattern layer, and a third middle pattern layer are respectively formed above the first bottom pattern layer, the second bottom pattern layer, and the third bottom pattern layer. The left sidewalls of the first middle pattern layer and the first bottom pattern layer are aligned, the right sidewalls of the second middle pattern layer and the second bottom pattern layer are aligned, and the two sidewalls of the third middle pattern layer and the third bottom pattern layer are respectively aligned. Then, a first top pattern layer, and a second top pattern layer are respectively formed above the first middle pattern layer and the third middle pattern layer. The left sidewall of the first top pattern layer and the first middle pattern layer is aligned, and the right sidewall of the second top pattern layer and the third middle pattern layer is aligned. Next, a sandblasting process is performed by using the bottom pattern layers, the middle pattern layers, and the top pattern layers as a mask, parts of the rib material layer is removed to exposed parts of the dielectric layer. Finally, the barrier ribs are completed formed by removing the bottom pattern layers, the middle pattern layers, and the top pattern layers.