Company Filing History:
Years Active: 2014-2019
Title: Innovations of Chung-Te Chou in Semiconductor Technology
Introduction
Chung-Te Chou is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.
Latest Patents
Chou's latest patents include a semiconductor structure having a high voltage well region. This innovative method for fabricating a semiconductor structure involves providing a substrate and implanting it to form a high-voltage well region with a first conductivity type. The process also includes forming a pair of drain drift regions in the high-voltage well region, which have a second conductivity type opposite to the first. Additionally, a gate electrode is embedded in the high-voltage well region, positioned between the drain drift regions.
Another notable patent is for a high voltage semiconductor device and method for fabricating the same. This device comprises a semiconductor substrate with a first conductivity type and a gate structure over a portion of the substrate. It features a pair of spacers on the gate structure's sidewalls, with one being a composite spacer. The device also includes a first drift region and a pair of doping regions, enhancing its functionality and efficiency.
Career Highlights
Chung-Te Chou is currently associated with Vanguard International Semiconductor Corporation, where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.
Collaborations
Chou has collaborated with notable colleagues, including Chih-Cherng Liao and Ya-Han Liang. Their combined efforts have further advanced the field of semiconductor technology.
Conclusion
Chung-Te Chou's work in semiconductor technology exemplifies innovation and dedication. His patents reflect a commitment to improving device performance and efficiency, making a lasting impact in the industry.