Company Filing History:
Years Active: 2010-2013
Title: **Innovations by Chung-Ru Yang: A Pioneer in Semiconductor Technology**
Introduction
Chung-Ru Yang is a prominent inventor based in Chung-Ho, Taiwan, known for his contributions to semiconductor technology. With a total of five patents to his name, he has made significant advancements in the field, focusing on improving semiconductor device systems and their manufacturing processes.
Latest Patents
Yang's latest innovations include a series of patents that address critical challenges in semiconductor design. One of his patents focuses on a source/drain carbon implant and rapid thermal annealing prior to silicon germanium (SiGe) deposition. This invention outlines a semiconductor device system, structure, and method of manufacture aimed at retarding dopant out-diffusion from a stressor. The illustrative embodiment emphasizes a strategically designed semiconductor substrate featuring a gate structure,with source and drain regions on either side. Yang's solution includes etched recessed areas in the source and drain with embedded doped stressors, further enhanced by the incorporation of a barrier dopant in remaining regions.
Another notable patent details a rapid thermal processing (RTP) spike annealing dopant activation method for semiconductor substrates. This patent describes a substrate equipped with multiple active device patterns, including regions with varying reflectance for near-infrared light. Yang innovatively presents a two-wavelength approach to optimize the RTP spike annealing process, ensuring efficient dopant activation.
Career Highlights
Chung-Ru Yang is currently associated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in the semiconductor industry. His work at TSMC has allowed him to push the boundaries of technology, ensuring that cutting-edge semiconductor devices meet the increasing demands of modern applications. Over his tenure, he has helped develop processes that enhance performance, reliability, and manufacturing efficiency.
Collaborations
During his career, Yang has collaborated with several esteemed colleagues, including Wei-Yen Woon and Chun-Feng Nieh. These partnerships have fostered an exchange of ideas and expertise, further enriching the innovative atmosphere at TSMC and contributing to the successful development of groundbreaking semiconductor technologies.
Conclusion
Chung-Ru Yang's contributions to the field of semiconductor technology exemplify the vital role of innovation in advancing industry standards. His patents not only serve as a testament to his ingenuity but also pave the way for future developments in semiconductor devices. As the technology landscape continues to evolve, the work of inventors like Yang remains crucial in shaping the innovations that drive progress forward.