Location History:
- Hsinchu, TW (1996 - 2000)
- Taipei, TW (2009)
Company Filing History:
2 out of 9,150 
2 out of 544 Years Active: 1996-2009
Title: Innovations of Chung L Lee
Introduction
Chung L Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electronics, holding a total of 4 patents. His work focuses on enhancing the functionality and efficiency of electronic devices.
Latest Patents
One of his latest patents is for a removable electronic device and method thereof. This invention includes a detector that identifies the mode of operation, distinguishing between multimedia card (MMC) compatible mode, universal serial bus (USB) compatible mode, and Mu mode. It features a wrapper for data transfer between the USB and Mu modes, along with a USB physical layer circuit and device controllers for both USB and MMC compatible modes.
Another significant patent is a method to suppress boron penetration in P+ MOSFETs. This invention addresses issues arising from boron doping in MOSFET gates, which can lead to diffusion problems. By implanting argon ions into the gate pedestal material before boron doping, Chung's method creates traps that act as a diffusion barrier. This technique is particularly effective for gate pedestals less than 3000 Angstroms thick, with specific implantation energies and dosages recommended for optimal results.
Career Highlights
Chung L Lee has worked with prominent organizations such as the Industrial Technology Research Institute and the National Science Council. His experience in these institutions has contributed to his innovative work in electronics.
Collaborations
He has collaborated with notable coworkers, including Wen C Huang and Tan F Lei, further enhancing his contributions to the field.
Conclusion
Chung L Lee's innovative patents and career achievements highlight his significant role in advancing electronic technology. His work continues to influence the industry and inspire future innovations.