Company Filing History:
Years Active: 2007
Title: Innovations of Chung-Jun Cheng in Chemical-Mechanical Polishing
Introduction
Chung-Jun Cheng is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of chemical-mechanical polishing, which is essential in various manufacturing processes, particularly in the semiconductor industry. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of polishing operations.
Latest Patents
Chung-Jun Cheng holds a patent for a "Chemical-mechanical polishing apparatus and method of conditioning polishing pad." This invention comprises a polishing platen, a polishing pad, slurry supplying piping, a polishing pad conditioner, chemical reagent supplying piping, and splitting piping. The design allows for effective delivery of slurry and chemical reagents to the polishing pad, improving the overall polishing process.
Career Highlights
Chung-Jun Cheng is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor manufacturing technologies.
Collaborations
Chung-Jun Cheng has collaborated with notable colleagues such as Sheng-Yu Chen and Te-Sung Hung. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Chung-Jun Cheng's contributions to chemical-mechanical polishing demonstrate his commitment to innovation and excellence in the semiconductor industry. His patent reflects a significant advancement in polishing technology, showcasing his expertise and dedication to improving manufacturing processes.