Hsinchu, Taiwan

Chung-I Yang

This inventor holds 9 USPTO granted patents and 9 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chung-I Yang. Retrieved from https://idiyas.com/inventor/chung-i-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 9 

% Patents Active = 100.0

Average Co-Inventor Count = 6.9

ph-index = 1


Company Filing History:


Years Active: 2022-2026

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9 patents (USPTO):Explore Patents

Title: Chung-I Yang: Innovator in Semiconductor Technology

Introduction

Chung-I Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on enhancing device performance through innovative methods and materials.

Latest Patents

Among his latest patents is a groundbreaking invention titled "Source/drain silicide for multigate device performance and method of fabricating thereof." This patent discloses a source/drain silicide that improves performance in multigate devices. The exemplary device includes a first channel layer over a substrate, a second channel layer above the first, and a gate stack surrounding both channel layers. The source/drain feature is strategically placed adjacent to these layers, with specific crystallographic orientations enhancing performance. Another notable patent is "Multi-gate devices and fabricating the same with etch rate modulation." This invention outlines a semiconductor device with vertically stacked channel members and a gate structure, emphasizing the importance of dopant concentration in optimizing device functionality.

Career Highlights

Chung-I Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leader in the semiconductor industry. His work at this esteemed company has allowed him to push the boundaries of semiconductor technology and contribute to advancements that benefit the industry as a whole.

Collaborations

Throughout his career, Chung-I has collaborated with notable colleagues, including Wen-Hsing Hsieh and Jon-Hsu Ho. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Chung-I Yang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in device performance and fabrication methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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